Technical background
(1)Ferrotec has been engaged in precise cleaning for 18 years, accumulated a large number of mature cleaning BKM, and continued to improve;
(2)Cooperate with world-renowned semiconductor equipment manufacturers to jointly develop leading cleaning technologies;
(3)In the first quarter of 2019, a Research and Development Centre for precision cleaning will be established to enhance the capability of failure analysis and advanced process research and development.
Clean environment
(1)Cu/Non-Cu is completely segregated by different production lines to reduce cross-contamination;
(2)Segregate cleaning of different processes, dedicated ceramic and quartz cleaning line to reduce pollution;
(3)The clean room adopts vertical flow mode, and the dust-free environment is easier to control;
(4)Dry-wet separation is used in clean room to reduce the risk of cross-contamination.
Equipment capability
Equipment | Shanghai Factory | Dalian Factory | Tongling Factory |
Air compressor | Oil | Oil | Oil-free |
CDA/N2 | CDA | N2(99.999%) | N2(99.999%) |
DI water | High-pure DIW(>16MΩ) | Ultra-pure DIW(>18MΩ) | Ultra-pure DIW(>18MΩ) |
Clean room | Turbulent circulation(Class 1000/Class 100) | Turbulent circulation(Class 1000/Class 100) | Vertical laminar circulation(Class 100/Class 10) |
Production Environment | Mixed products | Dedicated production line and controllable environment | Dedicated production line and controllable environment |
Automation | NA | Introduce automation equipment such as automatic bead blasting, power wash, etc. | Introduce automation equipment such as automatic bead blasting, power wash, etc. |
Precision measuring equipment
Measurement items | Measuring equipment | New factory |
Surface particle | Surface Particle Meter | 0.1um |
Liquid particle | LPC | 0.1um |
Key dimensions | CMM | 0.001mm |
Aperture | Imager | Fully automatic, 0.001um |
Micro-morphology | Keyence | 3000X |
Micro-crack | C-SAM | Cross-sectional scanning |